Gold cleaning methods for electrochemical detection applications

Author: Fischer, L.M.; Tenje, M.; Heiskanen, A.R.; Masuda, N.; Castillo, J.; Bentien, A.; Émneus, J.; Jakobsen, M.H.; Boisen, A.

Description: This work investigates methods for obtaining reliably clean gold film surfaces. Nine gold cleaning methods are investigated here: UV ozone photoreactor; potassium hydroxide–hydrogen peroxide; potassium hydroxide potential sweep; sulfuric acid hydrogen peroxide; sulfuric acid potential cycling; hydrochloric acid potential cycling; dimethylamine borane reducing agent solutions at 25 and 65 °C; and a dilute form of Aqua Regia. Peak-current potential-differences obtained from cyclic voltammetry and charge transfer resistance obtained from electrochemical impedance spectroscopy, as well as X-ray photo-electron spectroscopy are used to characterize surface cleanliness. A low peak-current potential-difference and charge transfer resistance indicates a cleaner surface, as does a higher percentage of elemental gold on the electrode surface. The potassium hydroxide potential sweep method is found to leave the gold surface the cleanest overall.

Subject headings: Gold cleaning; Electrochemistry; Cyclic voltammetry; Impedance spectroscopy

Publication year: 2009

Journal or book title: Microelectronic Engineering

Volume: 86

Issue: 4-6

Pages: 1282-1285

Find the full text : http://www.sciencedirect.com/science/article/pii/S0167931708005972

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Type: Journal Article

Serial number: 796